Instructor Biography	Course Description
Arvind Agarwal	Introduction to Nanomanufacturing and Nanotechnology
Richard Ahrenkiel	Fundamentals of Semiconductor Characterization: Electrical and Optical Techniques
Gary S. Ash	Cryopump Technology
Bharat Bhushan	Adhesion and Stiction: Mechanisms, Measurement Techniques, and Methods for Reduction Nanotribology and Nanomechanics and Applications to MEMS/NEMS and BioMEMS/BioNEMS
Peter Biltoft	Recent Advances in Vacuum Technology
Joel Bowers	Vacuum Vessel Engineering
C.R. Brundle	Full Wafer Particle and Defect Detection, Review, and Characterization Materials and Surface Microcharacterization and Analysis Surface Analysis, Interface, and Thin Film Analysis: The Major Methods Thin and Ultra-thin Film Analysis, Characterization & Metrology for the Wafer Processing Industry X-Ray Photoelectron Spectroscopy (XPS): The Basics and Advanced Approaches and Applications
David Castner	Surface Characterization of Biomaterials
John Caughman	Basics of Radio Frequency Technology
Bob Childs	An Overview of Applied Vacuum Technology Fundamentals of Vacuum Technology
Douglas Chrisey	Pulsed Laser Deposition for Thin Film Growth
Tom Christensen	Thin Film Characterization
John Coburn	Plasma Etching and RIE: The Fundamentals and Applications
Timothy Coutts	Transparent Conducting Oxides: Their Science, Fabrication, Properties, and Applications
John Crowell	CVD for Microelectronics
Michael Current	Ion Implantation: Fundamentals, Process Controls and Advanced Applications
Tom Dory	Semiconductor Device Manufacturing Overview
John Frankenthaler	Photolithography Process in IC Production
Steve George	Atomic Layer Deposition
Tim Gessert	Controlling Contamination in Vacuum Pump Systems Fundamentals of Vacuum Technology Operation and Maintenance of Vacuum Pumping Systems Vacuum Leak Detection Vacuum System Design
Abe Ghanbari	Introduction to Ion Sources: Principles and Techniques Plasma and Ion Beam Diagnostics: Principles & Applications
John Givens	Chemical Mechanical Planarization for Microelectronics Manufacturing Copper Interconnect Technology
Stanley Goldfarb	Partial Pressure Analysis
Joe Greene	Growth of Self-assembled Nanostructures Reactive Sputtering and Deposition Sputter Deposition Thin Film Nucleation, Growth, and Microstructural Evolution
Robert Grubbs	Atomic Layer Deposition: Basic Principles, Characterizations, and Applications
Luke Hinkle	Mass Flow Controllers: Fundamentals, Techniques, and Applications Process Specific Pumping Requirements and Design
Frank Jansen	Plasma-Enhanced CVD: Fundamentals, Techniques, and Applications
Bob Langley	Partial Pressure (RGA) Analysis
Allan Matthews	Hard Coatings by PVD Methods
Richard Matyi	High Resolution X-ray Reflection and Diffraction Methods for Thin Film Characterization
Gary McGuire	Surface Preparation for Thin Film Deposition
John Orloff	Focused Ion Beams: Principles and Applications
Ronald Outlaw	Fundamentals of Vacuum Technology UHV Design and Practices
Stella Pang	Microfabrication Technology for MicroElectroMechanical Systems
Neil Peacock	Total Pressure Gauging Techniques Vacuum Sealing and Joining Techniques
Karen Reinhardt	Cleaning and Surface Conditioning Techniques for Integrated Circuit Manufacturing
Mikko Ritala	Atomic Layer Deposition: Fundamentals, Chemistry and Applications
Angus Rockett	Sputter Deposition Photovoltaics: The Engineering, Technology, and Application of Solar Cells
Bridget Rogers	Semiconductor Device Manufacturing Overview
Phillip Russell	Atomic Force and Scanning Tunneling Microscopy Scanning Electron Microscopy and X-ray Microanalysis
Sudipta Seal	Introduction to Nanomanufacturing and Nanotechnology
Gary Selwyn	Optical Diagnostic Techniques for Plasma Processing
Randy Shul	Plasma Etching and RIE: The Fundamentals and Applications
T.C. Smith	Ion Implantation Processing
William Sproul	Hard Coatings by PVD Methods Sputter Deposition
Larry Stelmack	Introduction to Ion Beam Coating Deposition Techniques
Fred Stevie	A Comprehensive Course on Surface Analysis by X-Ray Photoelectron Spectroscopy (XPS or ESCA), Auger Electron Spectroscopy (AES), Focused Ion Beam Analysis (FIB) and Secondary Ion Mass Spectroscopy (SIMS) Focused Ion Beams: Principles and Applications Secondary Ion Mass Spectrometry
Robert Waits	Application of Residual Gas Analysis in Thin Film Processes Physical and Chemical Vapor Deposition Thin Film Deposition by Evaporation
Woody Weed	An Overview to Applied Vacuum Technology Fundamentals of Vacuum Technology Recent Advances in Vacuum Technology Vacuum Pumps
Randy Shul	Plasma Etching and RIE: The Fundamentals and Applications
Bill Westwood	Reactive Sputtering and Deposition Sputter Deposition

Questions? Contact Heather Korff, heather@avs.org, 530-896-0477