| David Adams
Sandia National Labs.
1515 Eubank Blvd., Bldg. 878 Room B1110C
Albuquerque, NM 87123
DAVID ADAMS is a Distinguished Member of the Technical Staff at Sandia National Laboratories (SNL) in Albuquerque, New Mexico. He received a Bachelor’s Degree in physics from the University of Virginia in 1989 and a Ph.D. in materials science & engineering from the University of Michigan in 1994. Adams joined SNL as a post-doctoral member in 1994 (collaborating with Thomas Mayer) and was promoted to the Technical Staff in 1997. He is currently a member of Sandia’s Materials Science Center. His research has largely focused on thin film growth processes and structure-property relationships. Currently, he is investigating the behavior of multilayer films that undergo rapid, self-sustained chemical reactions, the dynamic response of coatings to thermal and mechanical insult, and the ability to tailor film function via nanostructuring. He has published over 70 papers in refereed international journals and holds 7 U.S. patents. His AVS activities include: Advanced Surface Engineering Division Executive Committee (2016-2019, Chair 2019), Thin Film Division Executive Committee (2015-2016), and Short Course Committee (2015-2019, Chair 2018-2019). In addition, Adams continues to be an active member of the New Mexico Chapter of AVS enjoying his time as Chair (2002-2003; 2014-2015), Executive Committee Member, and Short Course Chair (2000–2019). Working with the New Mexico Chapter, he established a new AVS Division-level Award (Distinguished Thin Film Technologist) to recognize individuals who have provided exceptional technical support of research and development activities during their career.