Short Course Catalog | High Resolution X-ray Reflection and Diffraction Methods for Thin Film Characterization

Course: High Resolution X-ray Reflection and Diffraction Methods for Thin Film Characterization

Course Objectives

  • Define key concepts in X-ray scattering theory as they apply to the analysis of thin film materials.
  • Learn about high resolution X-ray analytical techniques.
  • Understand specific details regarding the application of high resolution X-ray diffractometry and X-ray reflectometry methods to problems that are of interest for thin film analysis.
  • Examine the strengths and limitations of high resolution methods.

Course Description

X-ray methods with high angular resolution are becoming increasingly important for the physical characterization of thin film materials and structures. Vendors now market state-of-the-art X-ray tools (both hardware and software) for the routine analysis of parameters such as layer thickness, chemical composition, strain relaxation, and interfacial roughness. The recent integration of X-ray diffraction and reflectivity systems into fab-compatible process metrology tools suggests that the importance of these techniques will only increase with time. Unfortunately, the users of X-ray analysis instruments (or the supervisors who are responsible for their use) often have had relatively little introduction to the theory that underpins their operation; they may not have an appreciation of quantity of information that can be gained from X-ray analyses or the deleterious effects that limitations in hardware, software, the sample, and the experimental technique can have. In this short course, will discuss some basic principles of high resolution X-ray methods (notably double axis X-ray diffractometry and high resolution X-ray reflectometry) and will describe the capabilities and limitations of these tools for thin film materials analysis. Extensive reference will be made to "real-life" problems involving bulk and thin-film structures (ranging from amorphous dielectrics and polycrystalline metals to highly perfect epitaxial single crystal materials) to show both the utility and the shortcomings of high resolution X-ray methods.

Who Should Attend?

Scientists, engineers, and technicians who use (or wish to use) high resolution X-ray methods for characterizing thin film materials.

Instructors

Richard Matyi Professor, College of Nanoscale Science and Engineering and Senior Scientist, Albany NanoTech, SUNY University at Albany

Course Materials

Course Notes

Cost: $690