Short Course Catalog | X-Ray Photoelectron Spectroscopy (XPS): The Basics and Advanced Approaches and Applications

Course: X-Ray Photoelectron Spectroscopy (XPS): The Basics and Advanced Approaches and Applications

Course Objectives

The Basics

  • Learn the physical principles of XPS (also known as ESCA, Electron Spectroscopy for Chemical Analysis)
  • Understand the principles of its use for identification, qualitative, and quantitative analysis of the elemental and chemical species present in a sample
  • Understand the surface sensitivity and microanalytical aspects of the technique and what types of materials and problems can be tackled by XPS

Advanced Approaches and Applications

  • Learn about the more advanced aspects of the spectroscopy that are useful for analysis purposes
  • Understand Angle-Resolved XPS and other related approaches for obtaining depth resolved information
  • Learn about the advanced applications being tackled by XPS, using case histories as examples
  • Understand where XPS fits in compared to other analytical techniques

Course Description

The first day covers all the basics needed to understand how XPS is used as a method to determine what atoms are present, and in what chemical state and relative proportions, for solid samples. The reasons for, and the extent of, its surface sensitivity, plus general sensitivity limits, and spatial resolution issues, are discussed. Ways to obtain depth profiles are introduced. The various types of instrumentation commercially available are introduced and compared. Examples of use for many types of material (bio to chemical industry to semiconductors) and different types of problems (eg. surface contamination, corrosion, catalysis, failure analysis, metrology) are used to illustrate strengths and weaknesses.

The optional second day covers the usage of more complex aspects of the spectroscopy for chemical state determination, with illustrative examples. Quantification of surface analysis is treated in detail. Angle- Resolved XPS and related approaches to non-destructive depth profiling for ultra-thin films are fully covered, including Photoelectron Diffraction for structural information. Current industry usage of XPS and Angle Resolved XPS, for characterization and metrology of ultra-thin films are reviewed. Finally XPS is put in context with other surface sensitive and microanalytical techniques in general use to help the student decide which approach is suitable for which problem.

Who Should Attend?

Scientists, engineers, students, and technicians who would like a detailed understanding of the use of XPS/ESCA for surface analysis.

Instructors

C.R. Brundle C.R. Brundle and Associates

Course Materials

Course Notes

Days: 2 Days


Cost: $690 (Day One); $1020 (Two Days)