Short Course Catalog
| X-ray Photoelectron Spectroscopy (XPS or ESCA), and Auger Electron Spectroscopy (AES)
Course: X-ray Photoelectron Spectroscopy (XPS or ESCA), and Auger Electron Spectroscopy (AES)
Become familiar with the basic principles of these two major electron spectroscopy materials analysis techniques.
Learn the capabilities (and limitations) of the techniques, and the principle applications
The course discusses all the basics needed to understand how XPS is used as a method to determine what atomic constituents are present, and in what proportions and chemical states, for solid samples. The reasons for, and the extent of, the surface sensitivity of the method are explained, together with general atomic concentration sensitivity limits, spatial resolution limits, approaches to qualitative and quantitative analysis, and depth profiling approaches. The various flavors of commercial instrumentation available are introduced and compared. Examples of use with many types of materials (bio to chemical industry to metallurgy and semiconductors) and for different types of problems (eg. surface contamination, corrosion, catalysis, failure analysis, metrology) are provided.
Many of the principles and applications of AES are the same, or similar, to those of XPS. So, after briefly explaining the basics, this section concentrates on explanation of the differences and indication when one or the other is more suitable to the application at hand.
Finally both techniques are compared with other analysis techniques used for surfaces and thin films, particularly the third major technique, SIMS.
Who Should Attend?
Scientists, engineers, technicians, and others who desire a practical, current understanding of XPS and AES.
C.R. Brundle and Associates
Cost: $690 One Day