Call For Abstracts - Focus Topics

 


2D Materials Focus Topic (2D)

The 2D Materials Focus Topic will review the world-wide effort exploring 2D materials covering their synthesis, characterization, processing, properties, and applications.  Papers are solicited in growth and fabrication; properties including electronic, magnetic, optical, mechanical, thermal properties; characterization including microscopy and spectroscopy; surface chemistry, functionalization, bio and sensor applications; dopants, defects, and interfaces; nanostructures including heterostructures; device physics and applications; novel 2D materials; and novel quantum phenomena in 2D materials.

2D1+AP+EM+MI+NS+PS+TF: 2D Materials Growth and Fabrication
  • David Geohegan, Oak Ridge National Laboratory, “Understanding and Controlling the Growth of 2D Materials with Non-Equilibrium Methods and in situ Diagnostics”
  • Jeehwan Kim, Massachusetts Institute of Technology, "Wafer Scale Manipulation of 2D Materials and Mixed Heterostructures"
2D2+EM+MI+NS: Properties of 2D Materials including Electronic, Magnetic, Mechanical, Optical, and Thermal Properties
  • Deep Jariwala, University of Pennsylvania, "Engineering Interfaces in the Atomically-Thin Limit"
  • Kin Fai Mak, Cornell University, "Towards Exciton Condensation in Transition Metal Dichalcogenide Double Layers"
2D3+AS+MI+NS: 2D Materials Characterization including Microscopy and Spectroscopy
  • Sarah Haigh, University of Manchester, UK
  • Phillip King, University of St Andrews, UK, "Charge Density-Wave States in Single-Layer Transition-Metal Dichalcogenides"
2D4+AS+BI+HC+MN+NS+PS+SS+TL: Surface Chemistry, Functionalization, Bio, Energy and Sensor Applications
  • Yu Huang, University of California at Los Angeles, "Interactions between Molecules and 2D Materials and Their Superstructures"
  • Arend van der Zande, University of Illinois at Urbana-Champaign, "Tailoring and Patterning 2D Material Interfaces through Chemical Functionalization"
2D5+EM+MI+NS+QS+SS: Dopants, Defects, and Interfaces in 2D Materials
  • Mark Hersam, Northwestern University, "Interfacial Engineering of Two-Dimensional Nanoelectronic Heterostructures"
  • Roland Wiesendanger, University of Hamburg, Germany, "Interfacial Superconductivity in 2D Layers"
2D6+AP+EM+MI+MN+NS+PS+TF: Nanostructures including Heterostructures and Patterning of 2D Materials
  • Jyoti Katochi, Carnegie Mellon University, “Quantum Phenomena in Two-dimensional Materials Driven by Atomic Scale Modifications”
2D7+EM+MN+NS: 2D Device Physics and Applications
  • Mark Edmonds, Monash University, Australia, “Electronic Properties of Ultra-Thin Na3Bi: A Platform for a Topological Transistor”
  • Ali Javey, University of California at Berkeley, "2D Semiconductor Electronics: Advances, Challenges and Opportunities"
2D8+EM+MI+MN+NS+QS: Novel 2D Materials
  • Evan Reed, Stanford University, "Revealing the Full Spectrum Layered Materials with Super-human Predictive Abilities"
  • Emanuel Tutuc, The University of Texas at Austin, "Rotationally Controlled van der Waals Heterostructures of 2D Materials"
2D9+EM+MI+MN+NS+QS: Novel Quantum Phenomena
  • Hongjun Gao, Chinese Academy of Sciences, China, “Observation of Majorana Bound States in an Iron-based Superconductor”
  • Jie Shan, Cornell University
2D10: 2D Poster Session
 


return to top



Actinides and Rare Earths (AC)

Actinides and rare earths exhibit many unique and diverse physical, chemical and magnetic properties resulting in large part to the complexity of their 5f and 4f electronic structure.  The Actinide and Rare Earth Focus Topic Sessions focus on the chemistry, physics and materials science of f–electron materials. Emphasis will be placed upon the 4f/5f electronic and magnetic structure, surface science, thin film properties, and applications to energy–related issues. The role of fundamental f–electron science in resolving technical challenges posed by actinide materials will be stressed, particularly with regard to energy applications, including energy generation, novel nuclear fuels, and structural materials. Both basic and applied experimental approaches, including synchrotron–radiation-based and neutron–based investigations, as well as theoretical modeling computational simulations, will be featured to reconcile the observed behavior in these complex materials.  Of particular importance are the issues important to nuclear energy and security, including fuel synthesis, oxidation, corrosion, intermixing, stability in extreme environments, prediction of properties via bench-marked simulations, separation science, and forensics. Specific sessions will be devoted to a continued, focused emphasis on the advances in the theory and measurements of core-level spectroscopies for the study of actinides and rare earths. Focus Topic emphasis will address advances in chemistry/materials sciences for environmental management and the participation of early career scientists.
 
AC1+LS+MI: Magnetism, Complexity, Superconductivity, and Electron Correlations in the Actinides and Rare Earths
  • Ryan Baumbach, Florida State University, “Probing Complex Magnetic and Structural Order Above the Kondo Coherence Temperature in UPt2Si2 and UCr2Si2”
  • Fengyuan Yang, Ohio State University, “Dynamic Spin Transport in Antiferromagnetic Insulators: Angular Dependent Spin Pumping in Y3Fe 5O12/NiO/Pt Trilayers”
  • Rena Zieve, University of California, Davis, “Pressure Studies of Superconductivity in Rare Earth Compounds”
AC2+AS+LS: Chemistry and Physics of the Actinides
  • Thomas Gouder, JRC Karlsruhe, Germany, “Electron Spectroscopy (XPS/BIS/ELS) Study of the Early Actinide Oxides and Fluorides – Systematics of the Electronic Structure”
  • Stefan Minasian, Lawrence Berkeley National Laboratory, “5f-Electron Behavior in Actinide Nanoparticles Embedded in Porous Frameworks”
  • Richard Wilson, Argonne National Lab, “Actinyl Chemistry in Alkaline Solutions”
AC3+AS+LS: Forensics and Special Applications
  • Andrew Duffin, Pacific Northwest National Lab, “Analysis of Aged of Uranium Particles via X-ray Spectromicroscopy”
  • Lynne Ecker, Brookhaven National Lab
AC4+AS+LS+MI: Actinide and Rare Earth Theory
  • Paul S. Bagus, University of North Texas, “Mechanisms Responsible for the Broadening of the XPS features of U Compounds: Extracting Chemical Information”
AC5+AS+LS: Science and Processing for Nuclear Energy
  • Pulak Dutta, Northwestern University, “Origin of Element Selectivity During Solvent Extraction of Rare Earths: Model Interface Studies”
  • Peter Hosemann, University of California Berkeley, “Helium Implantation Studies in Metals and Ceramics for Nuclear Energy Applications, Microstructure, and Properties”
AC6: Early Career Scientists
  • Scott Donald, Lawrence Livermore National Laboratory, “The Influence of Relative Humidity on the Oxidation of delta-Pu”
  • Lingfeng He, Idaho National Laboratory, "Advanced Characterization of Nuclear Fuels"
AC7: Actinides and Rare Earths Science Poster Session


 
return to top




Atomic Scale Processing (AP)

The AVS66 program will feature for the first time, the Atomic Scale Processing Focus Topic. This focus topic  will provide a unique forum to expand the scope of atomic layer deposition (ALD) and atomic layer etching (ALE) processes towards understanding the fundamentals needed to achieve true atomic scale precision and the application of such processing on various areas of interest to the broader AVS community.  The emphasis will be on synergistic efforts, across multiple AVS divisions and groups, to generate area selective processes as well as novel characterization methods to advance the field of processing at the atomic scale.  We are excited to offer several sessions in collaboration with Plasma Science & Technology Division, the Thin Film Division as well as the Electronic Materials and Photonics Division focusing on area selective deposition, atomic layer process chemistry and surface reactions, advancing metrology and characterization to enable Atomic Layer Processing, atomic layer etching, and emerging applications of atomic scale processing.

AP1+2D+EM+PS+TF: Area Selective Deposition and Selective-Area Patterning
  • Andrew Teplyakov, University of Delaware, “Mechanistic Insights into Thermal Dry Atomic Layer Etching of Cobalt”
AP2+EL+MS+PS+SS+TF: Advancing Metrology and Characterization to enable Atomic Layer Processing
  • Andy Antonelli, Nanometrics, "Surface, Interface, or Film: A Discussion of the Metrology of ALD Materials in Semiconductor Applications"
  • Jeffrey Elam, Argonne National Laboratory, “Elucidating the Mechanisms for Atomic Layer Growth through In Situ Studies”
  • James Hilfiker, J.A. Woollam, "In Situ Ellipsometry Characterization Of Atomic Layer Processes: A Review"
  • Akira Uedono, University of Tsukuba, Japan, "Open Spaces in Al2O3 Film Deposited on Widegap Semiconductors Probed by Monoenergetic Positron Beams"
AP3+2D+PS+TF: Integration of ALD and ALE
  • Sumit Agarwal, Colorado School of Mines, "Surface Chemistry during Plasma-Assisted ALE: What Can We Learn from ALD?"
  • Yoshihide Kihara, Tokyo Electron Miyagi Limited, Japan
  • Gregory Parsons, North Carolina State University, "Fully Integrated Isothermal ALD and Thermal ALE in a Single Reaction Chamber"
AP4+BI+PS+TF: Emerging Applications of Atomic Scale Processing
  • Dmitry Shashkov, Exogenesis Corporation, "Nanoscale Surface Modification of Medical Devices using Accelerated Neutral Atom Beam Technology"
AP5+PS+TF: Thermal Atomic Layer Etching
  • Yoshide Yamaguchi, Hitachi R&D Group, Japan, “A Challenge for Atomic-layer Etching of Non-volatile Materials Using Organometallic Complex”
AP6: Atomic Scale Processing Poster Session
 


return to top





Chemical Analysis and Imaging Interfaces (CA)

Chemical and physical processes occurring at surfaces and interfaces, including gas-liquid, solid-liquid, and gas-solid interface are important in many applications and do represent grand scientific and engineering challenges. This symposium aims to provide a platform to the latest developments of emerging techniques and scientific understanding using in situ/ex situ/non situ/operando imaging, spectroscopy and microscopy to investigate challenging surfaces and interfaces. Contributed abstracts covering applications in biology, catalysis, energy conversion and storage, environment, and material sciences are welcome. 
 
CA1+NS+SS+VT: Gas-Liquid Interfacial Analysis and Imaging
  • Hendrik Bluhm, Lawrence Berkeley National Laboratory, "Liquid/Vapor Interfaces Investigated with Photoelectron Spectroscopy"
  • Vicki Grassian, University of California San Diego, "Chemical Analysis and Imaging of Environmental Interfaces"
CA2+2D+AS+BI+NS: Solid-Liquid Interfacial Analysis and Imaging
  • Roger Rousseau, Pacific Northwest National Laboratory, "Theoretical Investigation of Reactivity at Complex Solid-Liquid Interfaces"
  • Miquel B. Salmeron, Lawrence Berkeley National Laboratory, "Solid-liquid Interfaces: A New Surface Science Frontier"
CA3+NS+SS+VT: Gas-Solid Interfacial Analysis and Imaging
  • Jeong Young Park, Korea Advanced Institute of Science and Technology (KAIST), Republic of Korea, "Chemical Reactions on Bimetal Surfaces with Operando Surface Techniques"
CA4+AS+BI+NS: Liquid-Liquid and Solid-Solid Interfacial Analysis
  • Utkur Mirsaidov, National University of Singapore, "In Situ Electron Microscopy in Studying Material Interfaces"
  • Huolin Xin, University of California at Irvine, “Artificial Intelligence--An Autonomous TEM for In-situ Studies"
CA5+AS+NS+SE+SS: Progress and Challenges in Industrial Applications
  • Paul Dietrich, SPECS Surface Nano Analysis GmbH, "Interfacial Studies using Ambient Pressure XPS"
  • John Notte, Zeiss, "High Resolution Imaging of Challenging Material Interfaces"
CA6+2D+AS+NS+SE+SS: Novel Development and Approaches of Interfacial Analysis
  • Xiaoqing Pan, University of California Irvine, "Structure and Dynamics of Catalysts Under Atmospheric Gas Pressure"
  • Feng Wang, Brookhaven National Lab, "In Operando Spectroscopy and Microscopy of the Electrode-Electrolyte Interface in Batteries"
CA7: Chemical Analysis and Imaging Interfaces Poster Session



return to top



Fundamental Aspects of Material Degradation (DM)

Degradation is an inevitable process with major implications for materials applications, process safety, and efficiency in areas such as catalysis, biomaterial performance, biofouling of ship hulls, and the corrosion of structural and additively manufactured materials. This FT will promote interdisciplinary discussion, highlight common problems, and encourage the development of a molecular level understanding of degradation processes. One important function of this Focus Topic will be to highlight the recent progress in atomic-scale characterization of solid/liquid interfaces; initial degrading mechanism in oxidizing environments and during electro- & photocatalytic processing; molecular level design of degradation protection. Areas of interest include e.g. catalyst degradation, dissolution reactions, oxidation and sintering, corrosion, biofouling, atomic scale insights at the solid/liquid interfaces, high-pressure techniques, locally resolved spectroscopy, material stabilities and technology for degradation protection, biomaterial degradation, electrochemical surface science.
 
DM1+BI+SS: Fundamentals of Catalyst Degradation: Dissolution, Oxidation and Sintering
  • Serhiy Cherevko, Helmholtz Institut Erlangen-Nürnberg für Erneuerbare Energie, Germany
DM2+BI+SS: Material Stabilities and Technology for Degradation Protection
  • Gerald Frankel, Ohio State University, "Design of Corrosion Resistant High Entropy Alloys"
  • Philippe Marcus, Univ. P&M Curie, Paris, France, "Key Issues for the Stability of Protective Surface Oxides"
DM3+BI+SS: Molecular Level Design for Preventing Biodegradation
  • Paul Molino, University of Wollongong, Australia, “Utilizing Experimental and MD Simulation Approaches in the Understanding and Design of Low Fouling Interfaces”
DM4: Fundamental Aspects of Materials Degradation Poster Session



return to top




Spectroscopic Ellipsometry (EL)

The FT Spectroscopic Ellipsometry integrates themes ranging from classical material science and thin film characterization to nanometer scale science and novel optical sensing concepts. We will host three oral sessions dedicated to traditional applications of spectroscopic ellipsometry in optical materials and thin film characterization as well as new and emerging topics. The first session will focus on classical research topics of ellipsometry as for instance optical coatings and inorganic thin films characterization. Furthermore, presentations on the ellipsometric investigation of novel optical and electronic materials and materials with subwavelength structures will be included. In the second oral session of the Spectroscopic Ellipsometry FT we will host presentations on novel experimental and theoretical approaches. This  topic will also include spectroscopic ellipsometry for the characterization of energy materials in response to the AVS 66 topic “Shaping our future: Materials, technologies and processes for the energy transition.” The third oral session is dedicated to the application of Spectroscopic ellipsometry for the Characterization of Organic Films and Biological Materials. As a highlight of our Spectroscopic Ellipsometry FT, the best student paper, which is selected based on the quality of the research, its presentation, and the discussion during the symposium, will be awarded with the Spectroscopic Ellipsometry FT student award. The Spectroscopic  Ellipsometry FT further hosts a poster session.
 
EL1+AS+EM+TF: Optical Characterization of Thin Films and Nanostructures
  • Alain C. Diebold, SUNY Polytechnic Institute
EL2+EM: Spectroscopic Ellipsometry: Novel Applications and Theoretical Approaches
  • Alyssa Mock, United States Naval Research Laboratory, “Generalized Ellipsometry for Materials with Low Crystal Symmetry”
EL3+AS+EM: Application of SE for the Characterization of Organic Films and Biological Materials
  • Eva Bittrich, Leibniz-Institut für Polymerforschung Dresden e.V., Germany, “Spectroscopic Ellipsometry on Organic Thin Films - From In-situ Bio-sensing to Active Layers for Organic Solar Cells”
EL4: Spectroscopic Ellipsometry Focus Topic Poster Session



return to top




Fundamental Discoveries in Heterogeneous Catalysis (HC): 

The Fundamental Discoveries in Heterogeneous Catalysis (HC) focus topic highlights recent advances in the understanding of the atomic and molecular basis for heterogeneously-catalyzed reactions on solid surfaces. This will be the fourth time the HC focus topic has been organized. This year, HC is coordinated with the Surface Science (SS) Division, and 2D Materials (2D) and Energy Transition (TL) focus topics. Emphasis will be on facilitating dialogue between surface science-based and applied communities studying heterogeneously-catalyzed systems. In addition to previous session topics including theoretical models, nanoscale structures, gas-surface dynamics, and other novel studies of active surfaces, several new areas will be explored. New sessions will focus on machine learning and artificial intelligence, building catalysts inspired by nature, exotic surfaces, and as well as challenges for energy production in line with the Symposium theme on energy transition. HC will highlight connections among theoretical and experimental approaches with the goal of revealing key details of the fundamental chemistry and physics underlying heterogeneous catalysis. Of particular interest are developments in chemical understanding, atomic-level details, and predictive models of reactions catalyzed by metal surfaces.

HC1+SS: Mechanisms, Reaction Pathways, and Dynamics of Heterogeneously-Catalyzed Reactions
  • Geert-Jan Kroes, Leiden, The Netherlands, "SRP-DFT Dynamics: a Chemically Accurate Approach to Dissociative Chemisorption Reactions"
HC2+2D+SS: Nanoscale Surface Structure in Heterogeneously-Catalyzed Reactions
  • Geoff Thornton, University College London, UK, "Structure and Reactivity of Supported Oxide and Metal Nanoparticles"
HC3+SS: Metal-Support Interactions Driving Heterogeneously-Catalyzed Reactions
  • Matteo Cargnello, Stanford University, "Understanding and Tuning Catalytic Materials Using Nanocrystal Precursors"
  • Donna Chen, University of South Carolina, "Understanding Metal-Metal and Metal-Support Interactions in Model Bimetallic Catalysts"
HC4+SS: Utilization of Theoretical Models, Machine Learning, and Artificial Intelligence for Heterogeneously-Catalyzed Reactions
  • Karsten Reuter, Technical University of Munich, Germany, "Knowledge-Based Approaches in Catalysis and Energy Modelling"
HC5+SS: Inspirations from Nature: Building Smarter Catalysts for Energy Applications
  • Junko Yano, Lawrence Berkeley National Laboratory, "Water Oxidation Reaction in Natural Photosynthesis"
  • Francisco Zaera, University of California, Riverside, "Design of Nanostructured Catalysts for Better Performance"
HC6+TL: Addressing Challenges for Energy Production in the 21st Century
  • Bruce Garrett, Department of Energy, “Fundamental Science to Meet Future Energy Needs: A Basic Energy Science Perspective”
  • Susannah Scott, University of California at Santa Barbara, "Nuclearity Effects in Supported Zinc and Gallium Catalysts for Alkane Dehydrogenation"
HC7+2D+SS: Design, Discovery, and Deployment of Exotic Nanostructured Surfaces
  • Matthias Batzill, University of South Florida, "Formation and Properties of Mirror Twin Grain Boundary Networks in Molybdenum Dichalcogenides"
  • Gareth Parkinson, TU Wien, Austria, "Understanding the Role of Coordination in Single-Atom Catalysis"
HC8: Fundamental Discoveries in Heterogeneous Catalysis Poster Session




  return to top


 

Advanced Ion Microscopy and Ion Beam Nano-Engineering (HI)

AVS 66 Advanced Ion Microscopy & Ion Beam Nano-Engineering focus topic targets research in focused ion beam technology and applications.   This includes microscopy, metrology, direct-write lithography, nano-machining, and nano-engineering applications. Emphasis is on applying novel ion beam technologies to enable scaling, supplementing, or replacing existing techniques historically used in semiconductors, life sciences, and other nano-microscopy applications.   This year's focus topic will feature the following four areas:  Advanced Ion Microscopy and Surface Analysis, featuring talks in He ion microscopy (HIM), Ne & Cs SIMS, neutral beam imaging,  and other novel ion beam imaging - analysis applications;   Novel Beam Induced Material Engineering & Nano-Patterning; Emerging Ion Source, Optics, and Applications, featuring talks on advances in GFIS, Cold Beams, and LMIS source technology.

HI1+AS+CA: Advanced Ion Microscopy and Surface Analysis Applications
  • Arkady V. Krasheninnikov, Helmholtz Zentrum Dresden-Rossendorf, Germany, “Effects of Ion Irradiation on Two-Dimensional Targets: What is Different from Bulk Materials”
  • Tom Wirtz, Luxembourg Institute of Science and Technology (LIST), Luxembourg, “npSCOPE: An Integrated GFIS Enabled Instrument Combining SE, SIMS and STIM Imaging”
HI2+NS: Novel Beam Induced Material Engineering and Nano-Patterning
  • Yunseok Kim, Sungkyunkwan University, Republic of Korea, "Tuning out-of-plane Piezoelectricity in 2D Materials using Ion Beams"
  • Lane Martin, University of California, Berkeley, "Defect Engineering of Ferroelectric Thin Films - Leveraging Ion Beams for Improved Function"
  • Jan Mol, University of Oxford, UK, "Towards Atomically Precise Carbon Quantum Electronic Devices"
HI3+NS: Emerging Ion Sources, Optics, and Applications
  • Jabez McClelland, National Institute of Standards and Technology (NIST), "Cold Atom Ion Sources"
  • Greg Schwind, Thermo Fisher Scientific, “Technology and Applications of a Plasma Multi-specie Ion Source”
HI4: Advanced Ion Microscopy Poster Session



return to top 



 

Frontiers of New Light Sources Appled to Materials, Interfaces, & Processing (LS)

This FT will be dedicated to recent progress in the field of “operando” studies for exploring transient states by following changes in structure and/or composition of the materials that are essential for all types of fabrication and operation steps. The emphasis will be on recent achievements using experimental techniques that have gained significantly from the brightness, coherence and time structure of the modern photon light sources. 
 
The subjects tackle one of the main challenges in development of smart functional materials – attaining full understanding of the mechanisms which control the properties and behavior of these very complex systems.  It has already been recognized that realization of knowledge-based design and implementation can be achieved only by exploring simultaneously structure, dynamics, function at multiple spatial, temporal and energy scales. In this respect, the continuously developing state-of-the art experimental techniques at synchrotron and free electron laser facilities are the key to a full understanding of the properties of a broad range of complex static and dynamic systems, paving the way to further technological advancements. The ongoing upgrades of the storage rings and the growing number of X-ray Free Electron Lasers (XFEL) are opening exciting opportunities for “watching” how matter behaves at ultra-short time scales (down to fs) and also to the level of nano-units, atoms and molecules. The presentations will highlight the most recent contributions linked to materials, technologies and processes for renewable energy generation and storage.

LS1+AS+SS: Operando Methods for Unraveling Fundamental Mechanisms in Devices Towards Renewable Energies

  • Jakub Drnec, European Synchrotron Radiation Facility, France, "X-Ray Insight Into Fuel Cell Catalysis: Operando Studies of Model Surfaces and Working Devices"
  • Wanli Yang, Lawrence Berkeley Lab, "Uncover the Mystery of Oxygen Chemistry in Batteries through High-Efficiency mRIXS and Theory"

LS2+HC+SS: Frontiers of Time-resolved Techniques for Energy & Catalysis Highlight Session

  • Martina Dall’Angela, Italian National Research Council, Italy, "Triplet Dynamics in Photovoltaic Materials Measured with Time Resolved X-Ray Spectroscopies"
  • Haiden Wen, Argonne National Lab, "Revealing Ultrafast Structural and Electronic Processes at Interfaces using Femtosecond X-Ray Surface Diffraction and Terahertz Emission Spectroscopy"

LS3+AC+NS: Photon Science for Imaging Materials from the Meso- to the Nanoscale

  • Kelsy Hatzell, Vanderbilt University, "Synchrotron X-Ray Tomography to Understand Structure and Physical Transformations in Solid State Batteries"

LS4+AC+HC+SS: Emerging Methods with New Coherent Light Sources

  • Bastian Pfau, Max Born Institute, Germany, "Ultrafast Magnetization Dynamics on the Nanoscale"
  • Kai Rossnagel, Kiel University, Germany, "Time-Resolved Photoemission at Free-Electron Lasers"

LS5: Frontiers of New Light Sources Applied to Materials, Interfaces, and Processing Poster Session
 


return to top



Complex Oxides: Fundamental Properties and Applications (OX) 

Complex oxides—including perovskites but also other oxides such as alumino-silicates, with two or more non-oxygen elements —are of rapidly emerging interest in current CMOS technology (memory, dielectrics), advanced electronics and spintronics, and in catalysis.  These materials present novel challenges regarding deposition and growth (e.g., pulsed laser deposition vs. sputter deposition vs. MBE vs. ALD), and present exciting surface and interface phenomena—including the formation of two-dimensional electron gases at surfaces or interfaces, interfacial spin-spin interactions, all-oxide heterostructures for electronics/spintronics, and novel catalysts and photocatalysts.  Abstracts are solicited in both fundamental aspects and applications, with emphasis on Electronic and Magnetic Properties; Dielectric Properties and Memory Applications; Catalysis, including photocatalysis, heterogeneous catalysis and electrocatalysis, in line with the Symposium theme on energy transition.

OX1+EM+MI+SS: Electronic and Magnetic Properties of Complex Oxide Surfaces and Interfaces
  • Peter A. Dowben, University of Nebraska-Lincoln, "Novel Multiferroic Ferrite Thin Films"
OX2+EM+MI+TF: Complex Oxides: Dielectric Properties and Memory Applications
  • Alexander Demkov, The University of Texas at Austin, "Optoelectronics with Oxides and Oxide Heterostructures"
  • Sebastian Engelmann, IBM T.J. Watson Research Center, "Potential Applications and Challenges for Complex Oxides in Advanced Memory and Computing Applications" 
OX3+HC+NS+SS: Complex Oxides in Catalysis
  • Scott Chambers, Pacific Northwest National Laboratory, "Electronic and Optical Properties of Epitaxial Complex Oxide Heterostructures – Insights and Surprises"
OX4: Complex Oxides: Fundamental Properties and Applications Poster Session



return to top

 

Materials and Processes for Quantum Information, Computing, and Science (QS) 

Materials and Processes for Quantum Information, Computing and Science will cover topics which interface micro-fabrication, surface science with quantum information, computing and science. It will cover all devices, materials and systems that enable quantum information processing. These will include but not limited to, NV centers, Ion traps, single photon amplifiers, multiplexers, and advances in cryogenic systems, vacuum technology and microwave to optical conversion schemes etc. Specific sessions will highlight the recent advances and challenges in quantum science and information processing, achieving higher coherence qubits and SiC, diamond and related materials for quantum information sciences. 

QS1+2D+EM+MN+NS+VT: Systems and Devices for Quantum Information Science
  • David Awschalom, University of Chicago, "Quantum Control of Spins in Silicon Carbide with Photons and Phonons"
  • Bouyer, Philippe, Laboratoire Photonique, Numérique et Nanosciences, Institut  d'Optique d'Aquitaine, France
  • David Alan Tennant, Oak Ridge National Laboratory
QS2+EM+MN+NS+VT: Systems and Devices for Quantum Computing
  • Alex Matos Abiague, Wayne State University, “Reconfigurable Magnetic Textures for Quantum Information Applications”
  • Stefan Filipp, IBM, Switzerland, “Efficient Quantum Computation using Problem-specific Quantum Hardware and Algorithms”
QS3+EM+MN+NS: High Coherence Qubits for Quantum Computing
  • Jonas Bylander, Chalmers University of Technology, Sweden, “Loss and Decoherence Benchmarking of Superconducting Transmon Qubits”
  • Hanhee Paik, IBM, T.J. Watson Research Center, “History of Superconducting Qubit Coherence and the Current Challenges”
  • Christopher Richardson, Laboratory for Physical Sciences, "Towards Epitaxial Nitride Josephson Junctions"
QS4+2D+EM+MN+NS: SiC, Diamond and Related Materials for Quantum Sciences
  • Trong Toan Tran, University of Technology Sydney, Australia, "Defect-based Quantum Systems in Hexagonal Boron Nitride"
QS5: Materials and Processes for Quantum Information Science Poster Session
 


return to top
 
 
 

New Challenges to Reproducible Data and Analysis (RA) 

This Focus Topic addresses the increasingly recognized challenges to reproducibility and replication that are impacting most areas of modern science. We mean reproducibility in a broad sense including the ability to reproduce or replicate a study, reproducibility of a synthesis, process, analysis or computation, and repeatability of a measurement.  A National Academies study, and many papers and editorials indicate that these issues impact almost all areas of science and in an AVS conducted survey 65% of those responding indicated that they have seen or experienced significant reproducibility issues. Challenges are associated with the increasing demands of complex research requiring use of multiple experimental and computational research methods. Abstracts are encouraged in the following areas: Causes of non-reproducibility and examples of their impacts on thin film synthesis and application, biomaterials, energy systems and measurement and analysis methods of importance to the AVS community; Understanding the nature, challenges and opportunities associated with large data sets or multiple-streams of data coming from an increasing number of sources and sensors/ detectors that may or may not be calibrated or standardized, data curation and archiving (including open science);  ways that reproducibility challenges can be addressed.  Examples of research approaches, establishing expectations, protocols, workflows, method validation, checklists and other efforts to address reproducibility issues are encouraged.

RA1+BI+PS+TF: How Good Research Can Go Wrong: Reproducibility and Reliability Issues Associated with Material Synthesis, Processing  and Properties

  • George Crabtree, Argonne National Laboratory, "Reproducibility in Fundamental and Applied Science"
  • Steven George, University of Colorado at Boulder, "Accuracy in Film Thickness, Roughness and Stress Measurements for ALD Films"
  • David Sholl, Georgia Institute of Technology, "Directly Assessing Reproducibility in Materials Chemistry Research Using Literature Meta-analysis"

RA2+AS+CA+SS: How Good Research Can Go Wrong: Why Analytical Methods and Data Interpretation/Analysis Matter and Common Types of Failure

  • Thomas Beebe, Jr., University of Delaware, "New Challenges in Analytical Reproducibility Illustrated with Old and New Case Studies"
  • Dianne Chong, Boeing, "Reproducibility and Replicability in Science and Engineering: a Report by the National Academies"

RA3+AS+NS+SS: Reproducibility Challenges: Future Proofing Your Data (including: Big Data, Multiple Data Streams, Analysis, and Access)

  • Robert Hanisch, National Institute of Standards and Technology (NIST), "A Data-Centric View of Reproducibility"
  • Steven Wiley, Pacific Northwest National Laboratory, "Enhancing Data Reliability, Accessibility and Sharing using Stealthy Approaches for Metadata Capture"

RA4+AS: Ways to Reduce/Minimize Reproducibility Problems

  • Sally McArthur, Swinburne University of Technology and CSIRO. Australia, Australia, "Dealing with Challenges in Reproducibility, Repeatability and Replicability at the Biointerface and Multidisciplinary Research"

RA5: New Challenges to Reproducible Data and Analysis Poster Session
 


return to top

 
 

Energy Transition (TL) 

The Energy Transition (TL) Focus Topic is being introduced in the AVS Symposium for the very first time in 2019, entirely organized by young investigators (students and post-docs) within AVS. This FT aims to highlight the breakthroughs and state-of-the-art advances in the field of energy transition.  Aligned with the symposium theme of “Shaping our future: Materials, technologies, and processes for energy transition,” this FT will feature invited contributions from eminent leaders in the field of energy transition. Their talks will focus on fundamental discoveries in heterogeneous catalysis, advancements in applied surface and interface science, innovations in materials development, and implementations of these new technologies within living labs.  To demonstrate the collaborative efforts of the AVS divisions and focus topics on addressing matters that relate to energy transitions, the sessions will be supported by the Heterogeneous Catalysis FT, Surface Science Division, Applied Surface Science, Manufacturing Science & Technology, Thin Films, and Vacuum Technology divisions. We are also delighted to announce that one of the sessions in this FT will be featuring a panel discussion to facilitate the sharing of information and ideas within the community.  Thus, all sessions in this FT will highlight the innovative work addressing the relevant energy concerns and exhibiting the collaborative nature of interfacial science. Finally, this FT will feature a poster session welcoming contributions in the field of energy conversion and storage from junior researchers.
 
TL1+2D+HC+SS: Surface Reaction Mechanisms in Energy Conversion (ALL INVITED SESSION)
  • Ulrike Diebold, TU Wien, Austria, "Understanding Fundamental Energy Conversion Mechanisms: How Surface Science Can Help"
  • Annemarie Huijser, University of Twente, The Netherlands, "Controlling Ultrafast Photochemical Reactions in Photocatalysis"
  • Jörg Libuda, Friedrich-Alexander-Universitaet Erlangen-Nuernberg, Germany, "Atomically-defined Model Interfaces in Energy-related Catalysis, Electrochemistry, and Photoelectrochemistry"
  • Charlie Sykes, Tufts University, "Single-Atom Alloy Catalysts: Born in a Vacuum, Tested in Reactors, and Understood In Silico"
  • Emily Weiss, Northwestern University, "Colloidal Quantum Dots: from Photophysics to Photochemistry"
TL2+AS+SS+TF: Breakthroughs and Challenges in Applied Materials for Energy Transition (ALL INVITED SESSION)
  • Seth Darling, Argonne National Laboratory, "Interface Science and Engineering for Energy-Water Systems"
  • Betar Gallant, Massachusetts Institute of Technology, "From Waste to Energy: Building Batteries that Consume Greenhouse Gases"
  • Seiji Takeda, Osaka University, Japan, "Atomic Surface Dynamics of Gold Catalysts Revealed by Time Resolved Environmental Transmission Electron Microscopy in Reaction Conditions"
  • Ken Nauman, Von Ardenne North America, “Developing and Scaling Up the Manufacturing of Thin Film Materials for the Future of Energy Production and Storage”
TL3+MS+VT: Implications of Implementation: Making Energy Transition a Reality (ALL INVITED SESSION)
  • Marcelo Carmo, Forschungszentrum Jülich GmbH, Germany, “Perspectives on the Research and Development of Nanomaterials for Hydrogen Production”
  • Wilson Smith, TU Delft, The Netherlands, Netherlands, "The Electro-refining of Renewable Sources to Sustainably Produce Chemicals and Fuels"
  • Richard M.C.M. van de Sanden, DIFFER, Eindhoven University, The Netherlands, “The Energy Transition: Science and Technology Development Aspects”
TL4: Energy Transition Poster Session



return to top