Call For Abstracts - Program Committee


  PROGRAM CHAIR
Eric A. Joseph
IBM Research Division 
T.J. Watson Research Center
  PROGRAM VICE CHAIR
Mariadriana Creatore
Eindhoven University of Technology 
The Netherlands
2D MATERIALS
  • Co-Chair: Gunlycke, Daniel, Naval Research Laboratory
  • Co-Chair: Oleynik, Ivan, University of South Florida
  • Batzill, Matthias, Univ. of South Florida
  • Chuang, Tien-Ming, Academia Sinica, Taiwan
  • Jauho, Antti-Pekka, Technical University of Denmark, Denmark
  • Mo, Sung-Kwan, Lawrence Berkeley Lab, University of California, Berkeley
  • Qian, Xiaofeng, Texas A&M University
  • Warner, Jamie, University of Oxford, UK
  • Xiao, Kai, Oak Ridge National Laboratory
 
ACTINIDES AND RARE EARTHS
  • Co-Chair: Shuh, David, Lawrence Berkeley National Laboratory
  • Co-Chair: Tobin, James G., University of Wisconsin-Oshkosh
  • Bagus, Paul, University of North Texas
  • Denecke, Melissa, University of Manchester, UK
  • Durakiewicz, Tomasz, Los Alamos National Laboratory
  • Geeson, David, AWE, UK
  • Havela, Ladislav, Charles University, Prague, Czech Republic
  • Nelson, Art, Lawrence Livermore National Laboratory
  • Rosa, Priscila, Los Alamos National Lab.
  • Vitova, Tonya, Karlsruhe Institute of Technology, Germany
 
ADVANCED ION MICROSCOPY
  • Chair: Livengood, Richard, Intel Corporation, USA
  • Golzhauser, Armin, Bielefeld University, Germany
  • Hlawacek, Gregor, Helmholtz Zentrum Dresden-Rossendorf, Germany
  • Notte, John A., Carl Zeiss Microscopy, LLC
  • Ogawa, Shinichi, National Institute of Advanced Industrial Science and Technology (AIST), Japan
  • Ovchinikova, Olga, Oak Ridge National Laboratory
 
ADVANCED NANOPHOTONICS METROLOGY
  • Chair: Klimov, Nikolai, National Institute of Standards and Technology
  • Ahmed, Zeeshan, National Institute of Standards and Technology
  • Goldsmith, Randall, University of Wisconsin-Madison
  • Ilic, Robert, NIST
 
ADVANCED SURFACE ENGINEERING
  • Chair: Franz, Robert, Montanuniversität Leoben, Austria
  • Klemberg-Sapieha, Jolanta, Ecole Polytechnique de Montreal, Canada
  • Kodambaka, Suneel, University of California at Los Angeles
  • Lin, Jianliang, Southwest Research Institute
  • Panjan, Matjaz, Jozef Stefan Institute, Slovenia
  • Voevodin, Andrey, University of North Texas
 
APPLIED SURFACE SCIENCE
  • Chair: Pacholski, Michaeleen, The Dow Chemical Company
  • Co-Chair: Artyushkova, Kateryna, University of New Mexico
  • Brumbach, Michael, Sandia National Labs
  • Engelhard, Mark, Pacific Northwest National Laboratory  
  • Fenton, Jeffrey, Medtronic
  • Fisher, Gregory L., Physical Electronics
  • Gaskell, Karen, University of Maryland, College Park
  • Grehl, Thomas, IONTOF GmbH, Germany
  • Haasch, Richard, Frederick Seitz Materials Research Laboratory
  • Lerach, Jordan, The Pennsylvania State Univ.
  • Matthews, Tamlin, Two Pore Guys, Inc.
  • Nunney, Tim, Thermo Fisher Scientific, UK
  • Ohlhausen, James, Sandia National Labs
  • Pylypenko, Svitlana, Colorado School of Mines
  • Spool, Alan, Western Digital Corporation
 
BIOMATERIAL INTERFACES
  • Chair: Baio, Joe, Oregon State University
  • Carroll, Nick, University of New Mexico
  • Graham, Dan, University of Washington
  • Howell, Caitlin, University of Maine
  • Leggett, Graham, University of Sheffield, UK
  • Rosenhahn, Axel, Ruhr-University Bochum, Germany
  • Theilacker, Bill, Medtronic
  • Valtiner, Markus, Vienna University of Technology, Austria
  • Weidner, Tobias, Aarhus University, Denmark
 
BIOMATERIALS PLENARY SESSION
  • Chair: Baio, Joe, Oregon State University

ELECTRONIC MATERIALS & PHOTONICS
  • Chair: Myers-Ward, Rachael, U.S. Naval Research Laboratory
  • Abate, Yohannes, Georgia State University
  • Antonelli, Andy, Nanometrics
  • Biyikli, Necmi, University of Connecticut
  • Dietz, Nikolaus, Georgia State University
  • Douglas, Erica, Sandia National Laboratories
  • Filler, Michael, Georgia Institute of Technology
  • Gupta, Shalini, Northrop Grumman ES
  • Han, Sang M., University of New Mexico
  • Hanbicki, Aubrey, Naval Research Laboratory
  • Hilton, Jessica, RHK Technology
  • Kapadia, Rehan, University of Southern California
  • Kawasaki, Jason, University of Wisconsin - Madison
  • Kim, Hyun Jung, NASA Langley
  • King, Sean, Intel Corporation
  • King, Seth, University of Wisconsin – 
  •    La Crosse
  • Kummel, Andrew, University of California at San Diego
  • Paquette, Michelle, University of Missouri-Kansas City
  • Rockett, Angus, Colorado School of Mines
  • Strandwitz, Nicholas, Lehigh University
  • Tischler, Joseph, U.S. Naval Research Laboratory
  • Tsai, Wilman, Taiwan Semiconductor Manufacturing Company (TSMC)

EXHIBITOR TECHNOLOGY SPOTLIGHT
  • Chair: DeGennaro, Jeannette, AVS

EXTENDING ADDITIVE MANUFACTURING TO THE ATOMIC SCALE
  • Co-Chair: Ballard, Joshua, Zyvex Labs
  • Co-Chair: Dyckoe, Ondrej, Oak Ridge National Laboratory
  • Felts, Jonathan, Texas A&M University
  • Namboodiri, Pradeep, National Institute of Standards and Technology
  • Rack, Philip, Univ. of Tennessee Knoxville
  • Ramasse, Quentin, University of Leeds, UK, United Kingdom of Great Britain and Northern Ireland
  • Susi, Toma, University of Vienna, Austria
 
FUNDAMENTAL DISCOVERIES IN HETEROGENEOUS CATALYSIS
  • Co-Chair: Baber, Ashleigh, James Madison University
  • Co-Chair: Killelea, Daniel, Loyola University Chicago
  • Chen, Donna, University of South Carolina
  • Jackson, Bret, University of Massachusetts - Amherst
  • Kimmel, Greg, Pacific Northwest National Laboratory
  • Roy, Sharani, University of Tennessee
  • Sykes, E. Charles, Tufts University
  • Utz, Arthur, Tufts University
  • Weaver, Jason, University of Florida
INDUSTRIAL PHYSICS FORUM
  • Co-Chair: Ludeke, Rudy, IBM Emeritus
  • Co-Chair: McArthur, Sally, Swinburne University of Technology and CSIRO, Australia
  • Alexander, Morgan, University of Nottingham
  • Bardi, Jason, American Institute of Physics
  • Belu, Anna, Medtronic
  • Bentley, William, University of Maryland College Park
  • Castner, David, Univerity of Washington
  • Graham, Dan, University of Washington
  • Hammer, Bo, American Institute of Physics
  • Hollenhorst, Jim, Agilent Technologies

IN-SITU MICROSCOPY, SPECTROSCOPY, AND MICROFLUIDICS 
  • Co-Chair: Guo, Hongxuan, National Institute of Standards and Technology
  • Co-Chair: Kolmakov, Andrei, NIST Center for Nanoscale Science and Technology
  • Co-Chair: Liddle, Alexander, National Institute of Standards and Technology
  • Damiano, John, Protochips Inc.
  • Hitchcock, Adam, McMaster University
  • Kelly, Deborah, Virginia Tech Carilion Research Institute
  • Mølhave, Kristian, Technical University of Denmark
  • Stach, Eric, University of Pennsylvania
 
MAGNETIC INTERFACES & NANOSTRUCTURES
  • Chair: Ohldag, Hendrik, SLAC National Accelerator Laboratory
  • Baio, Joe, Oregon State University
  • Donath, Markus, Westfälische Wilhelms-Universität Münster, Germany
  • Enders, Axel, University of Bayreuth, Germany
  • Hanbicki, Aubrey, Naval Research Laboratory
  • Hoffmann, Axel, Argonne National Laboratory
  • Kukreja, Roopali, University of California at Davis
  • Lauter, Valeria, Oak Ridge National Lab.
  • Lukaszew, Ale, College of William and Mary
  • Mueller, Martina, Forschungszentrum Juelich GmbH, Germany
  • Myers-Ward, Rachael, U.S. Naval Research Laboratory
  • Oleynik, Ivan, University of South Florida
  • Woltersdorf, Georg, Martin Luther University Halle-Wittenberg, Germany
  • Wu, Ruqian, Univ. of California Irvine
 
MANUFACTURING SCIENCE & TECHNOLOGY
  • Chair: Rogers, Bridget, Vanderbilt University
  • Diebold, Alain C., Colleges of Nanoscale Science and Engineering, SUNY Polytechnic Institute
  • Lad, Robert, University of Maine
  • Rubloff, Gary, University of Maryland, College Park
  • Seebauer, Edmund, University of Illinois at Urbana-Champaign
  • Smentkowski, Vincent, General Electric Global Research Center
  • Svedberg, Erik B., The National Academies

MATERIALS AND PROCESSES FOR QUANTUM COMPUTING 
  • Chair: Adiga, Vivekananda, IBM Research Division, T.J. Watson Research Center
  • Brink, Markus, IBM Research Division, T.J. Watson Research Center
  • Ilic, Bojan Robert, NIST
  • Mutus, Josh, Google Inc
  • Paik, Hanhee, IBM Research Division, T.J. Watson Research Center
  • Sandberg, Martin, IBM Research Division, T.J. Watson Research Center
  • Yoder, Jonilyn, MIT Lincoln Laboratory
MEMS & NEMS
  • Chair: Kotru, Sushma, The University of Alabama
  • Co-Chair: Davis, Robert, Brigham Young University
  • Blain, Matthew, Sandia National Laboratory
  • Burkett, Susan, The University of Alabama
  • Dhayal, Marshal, CSIR Centre for Cellular and Molecular Biology (CCMB), India
  • Diao, Zhu, Halmstad University/Stockholm University, Sweden
  • Feng, Philip, Case Western Reserve University
  • Ghodssi, Reza, University of Maryland, College Park
  • Gousev, Evgeni, Qualcomm MEMS Technologies, Inc.
  • Hanay, Selim, Bikent University, Turkey
  • Hentz, Sébastien, Cea Leti, France
  • Hiebert, Wayne, National Institute for Nanotechnology, Canada
  • Ilic, Robert, NIST
  • Krylov, Slava, Tel Aviv University, Israel
  • Maboudian, Roya, University of California at Berkeley
  • Metzler, Meredith, University of Pennsylvania
  • Naik, Akshay, Indian Institute of Science, India
  • Ng, Tse Nga (Tina), University of California at San Diego
  • Sumant, Anirudha, Argonne National Lab.
  • Thundat, Thomas, Univ. of Alberta, The National Institute for Nanotechnology, Canada
  • Tian, Wei-Cheng, National Taiwan University, Taiwan, Republic of China
  • Wang, Max Zenghui, Case Western Reserve University
  • Zorman, Christian, Case Western Reserve University

NANOMETER-SCALE SCIENCE & TECHNOLOGY
  • Chair: Ilic, Robert, NIST
  • Chair: Kalinin, Sergei, Oak Ridge National Laboratory
  • Co-Chair: Cohen, Sidney, Weizmann Institute of Science, Israel
  • Ballard, Joshua, Zyvex Labs
  • Borovsky, Brian, St. Olaf College
  • Burnham, Nancy, Worcester Polytechnic Institute
  • Czaplewski, David, Center for Nanoscale Materials, Argonne National Lab.
  • First, Phillip, Georgia Institute of Technology
  • Hanbicki, Aubrey, Naval Research Laboratory
  • Kim, Tae-Hwan, Pohang University of Science and Technology, Republic of Korea
  • Li, An-Ping, Oak Ridge National Laboratory
  • Seshadri, Indira, IBM Research Division, Albany, NY
  • Sharma, Renu, NIST
  • Ventrice, Jr., Carl, SUNY Polytechnic Inst.
 
NOVEL TRENDS IN SYNCHROTRON AND FEL-BASED ANALYSIS
  • Co-Chair: Hussain, Zahid, Advanced Light Source, Lawrence Berkeley National Laboratory
  • Co-Chair: Kiskinova, Maya, Elettra-Sincrotrone Trieste, Italy
  • Co-Chair: Renault, Olivier, CEA/LETI-University Grenoble Alpes, France
  • Carla, Francesco, ESRF
  • Fadley, Charles, Univ. of California, Davis
  • Liu, Zhi, ShanghaiTech University, China
  • Molodtsov, Sergueï, XFEL, Germany
  • Rossnagel, Kai, Kiel University, Germany
  • Schneider, Claus Michael, Peter Gruenberg Institute, Forschungszentrum Juelich GmbH, Juelich, Germany
  • Ueda, Shigenori, NIMS
 
PLASMA BIOLOGY, AGRICULTURE, AND ENVIRONMENT
  • Chair: O'Connell, Deborah, University of York, UK
  • Agarwal, Ankur, KLA-Tencor
  • Graves, David, University of California at Berkeley
  • Hamaguchi, Satoshi, Osaka Univ., Japan
  • Mededovic Thagard, Selma, Clarkson University
  • Park, Gyungsoon, Kwangwoon University, Republic of Korea
  • Reniers, Francois, Université Libre de Bruxelles
 
PLASMA SCIENCE & TECHNOLOGY
  • Chair: Agarwal, Ankur, KLA-Tencor
  • Agarwal, Sumit, Colorado School of Mines
  • Despiau-Pujo, Emilie, LTM, Univ. Grenoble Alpes, CEA-LETI, France
  • George, Steven, University of Colorado at Boulder
  • Gordon, Michael, University of California at Santa Barbara
  • Hayashi, Hisataka, Toshiba, Japan
  • Johnson, Erik V., LPICM, Ecole Polytechnique, France
  • Kanarik, Keren, Lam Research
  • Koga, Kazunori, Kyushu University, Japan
  • Lishan, David, Plasma-Therm LLC
  • Maeda, Kenji, Hitachi High Technologies America Inc.
  • O'Connell, Deborah, Univ. of York, UK
  • Pargon, Erwine, CNRS-LTM, Université Grenoble Alpes, France
  • Ranjan, Alok, Tokyo Electron Miyagi Limited, Japan
  • Reniers, Francois, Université Libre de Bruxelles
  • Samukawa, Seiji, Tohoku Univeversity, AIST, Japan
  • Sankaran, Mohan, Case Western Reserve University
  • Shearer, Jeffrey, IBM Research Division, Albany, NY
  • Sriraman, Saravanapriyan, Lam Research Corporation
  • Tatsumi, Tetsuya, Sony Semiconductor Solutions Corporation, Japan
  • Van de Sanden, Richard, DIFFER, Netherlands
  • Vasquez Jr., Magdaleno, University of the Phillippines, Phillippines
  • Vitale, Steven, MIT Lincoln Laboratory
  • Walton, Scott, Naval Research Laboratory
  • Wang, Mingmei, TEL Technology Center, America, LLC
  • Yeom, GeunYoung, Sungkyunkwan University, Republic of Korea
 
PROCESSING AND CHARACTERIZATION OF AIR-LIQUID, SOLID-LIQUID AND AIR-SOLID INTERFACES
  • Co-Chair: Kolmakov, Andrei, NIST Center for Nanoscale Science and Technology
  • Co-Chair: Nonnenmann, Stephen, University of Massachusetts - Amherst
  • Co-Chair: Yu, Xiao-Ying, Pacific Northwest National Laboratory
  • Baer, Donald, Pacific Northwest National Laboratory
  • Pacholski, Michaeleen, The Dow Chemical Company

RECONFIGURABLE MATERIALS AND DEVICES FOR NEUROMORPHIC COMPUTING
  • Chair: Hoskins, Brian, NIST Center for Nanoscale Science and Technology
  • Adam, Gina, Institute for Microtechnologies, Romania
  • Ilic, Bojan Robert, NIST
  • Madhavan, Advait, National Institute of Standards and Technology, Center for Nanoscale Science and Technology
  • Skowronski, Marek, Carnegie Mellon Univ.

SPECTROSCOPIC ELLIPSOMETRY
  • Chair: Hofmann, Tino, University of North Carolina at Charlotte
  • Co-Chair: Diebold, Alain C., Colleges of Nanoscale Science and Engineering, SUNY Polytechnic Institute
  • Co-Chair: Zollner, Stefan, New Mexico State University
  • Aspnes, David, North Carolina State University
  • Creatore, Mariadriana, Eindhoven University of Technology, The Netherlands
  • Hilfiker, James, J.A. Woollam Co., Inc.
  • Hingerl, Kurt, University Linz, Austria
  • Liu, Shiyuan, Huazhong University of Science and Technology, China
 
SURFACE SCIENCE
  • Chair: Sykes, Charles, Tufts University
  • Arnadottir, Liney, Oregon State University
  • Bartynski, Robert, Rutgers, the State University of New Jersey
  • Chen, Donna, University of South Carolina
  • Juurlink, Ludo, Leiden Institute of Chemistry, The Netherlands
  • Kay, Bruce D., Pacific Northwest National Lab.
  • Koel, Bruce, Princeton University
  • Mullins, David, Oak Ridge National Laboratory
  • Parkinson, Gareth, TU Wien, Austria
  • Reinke, Petra, University of Virginia
  • Tait, Steven, Indiana University
  • Teplyakov, Andrew, University of Delaware
  • Utz, Arthur, Tufts University
 
THIN FILM
  • Chair: Poodt, Paul, Holst Centre / TNO, Netherlands
  • Adams, David, Sandia National Laboratories
  • Akyildiz, Halil, Uludag University, Turkey
  • Allred, David, Brigham Young University
  • Becker, Joe, Kurt J. Lesker Company
  • Cansizoglu, Hilal, University of California, Davis
  • Cavanagh, Andrew, University of Colorado Boulder
  • Conley, John, Oregon State University
  • Creatore, Mariadriana, Eindhoven University of Technology, The Netherlands
  • Fitz-Gerald, James, University of Virginia
  • George, Steven, University of Colorado at Boulder
  • Grubbs, Robert, Micron Technology
  • Guisinger, Nathan, Argonne National Lab.
  • Gupta, Subhadra, University of Alabama
  • Jur, Jesse, North Carolina State University
  • Kachian, Jessica, Applied Materials
  • Kalanyan, Berc, National Institute of Standards and Technology
  • Kessels, Erwin, Eindhoven University of Technology, The Netherlands, Netherlands
  • Kumah, Divine, North Carolina State University
  • Lewis, Jay, RTI International
  • Linford, Matthew, Brigham Young University
  • Losego, Mark, Georgia Institute of Technology
  • Mei, Antonio, University of Illinois at Urbana-Champaign
  • Muscat, Anthony, University of Arizona
  • Nejati, Siamak, University of Nebraska-Lincoln
  • Owen, Allen, University of Alabama
  • Parsons, Gregory, North Carolina State University
  • Pedersen, Henrik, Linköping University, Sweden
  • Peng, Qing, University of Alabama
  • Rieth, Loren, University of Utah
  • Scarel, Giovanna, James Madison University
  • Sobczak, Cathy, Sandia National Labs
  • Stiff-Roberts, Adrienne, Duke University
  • Vallee, Christophe, LTM, Univ. Grenoble Alpes, CEA-LETI, France
  • Vanfleet, Richard, Brigham Young Univ.
  • Wang, Xudong, University of Wisconsin-Madison
  • Wheeler, Virginia, U.S. Naval Research Laboratory
  • Yanguas-Gil, Angel, Argonne National Laboratory
  • Yu, Cunjiang, University of Houston
  • Zuilhof, Han, Wageningen University, Netherlands
 
TRIBOLOGY
  • Co-Chair: Mangolini, Filippo, The University of Texas at Austin
  • Co-Chair: Schall, J. David, Oakland University
 
VACUUM TECHNOLOGY
  • Chair: Brucker, Gerardo, MKS Instruments, Inc., Pressure and Vacuum Measurement Group
  • Co-Chair: Borichevsky, Steve, Applied Materials, Varian Semiconductor Equipment
  • Carter, Jason, Argonne National Laboratory
  • Hendricks, Jay, National Institute of Standards and Technology
  • Fedchak, James, National Institute of Standards and Technology
  • Lanza, Giulia, SLAC National Accelerator Lab.
  • Li, Yulin, Cornell University
  • Lushtak, Yevgeniy, SAES Getters USA
  • Peacock, Neil, Consultant
  • Ricker, Jacob, National Institute of Standards and Technology
  • Scherschligt, Julia, NIST
  • Stutzman, Marcy, Thomas Jefferson National Accelerator Facility
  • Valente Feliciano, Anne Marie, Thomas Jefferson National Accelerator Facility
  • Van Drie, Alan,  Tri Alpha Energy, Inc. 
  • Wüest, Martin, INFICON Ltd., Liechtenstein