Short Courses

AVS short courses provide training for technicians, scientists, and engineers in three broad categories: Vacuum and Equipment Technology; Materials and Interface Characterization; and Materials Processing.

The AVS National Short Course Program will take place in conjunction with the AVS 65th International Symposium & Exhibition at the Long Beach Convention Center in Long Beach, California, October 22-25, 2018.


An Introduction to Ion Sources: Principles and Techniques

Course Objectives
  • Learn about ion formation, ionization, and recombination collisions.
  • Understand gaseous breakdown and plasma formation.
  • Know the collective behavior of particles in electric and magnetic fields.
  • Understand the operating principles of widely used ion sources.
  • Learn about extraction and transport of the ion beam from ion sources.
  • Know design and fabrication of ion sources and materials limitations.
  • Learn about applications of ion beams and sources in research and industry.

Instructor: Abe Ghanbari, CTO, Semblant 
Date:  October 24, 2018 (W)

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Fundamentals of Vacuum Technology

Course Objectives
  • Understand vacuum fundamentals essential to operating, maintaining, designing, or using vacuum systems
  • Know the working principles and limitations of pumps, gauges, and other vacuum system components
  • Understand the procedures for operating and performing preventive maintenance on vacuum systems, including analyzing and troubleshooting malfunctioning vacuum systems and leak detection
  • Learn the design concepts involved in matching equipment and instrumentation to applications 

Instructors: Allen Riddle Senior Engineer at the National Ignition Facility at Lawrence Livermore National Laboratory ; Tim Gessert, Senior Scientist, EPIR Inc.
Date:  October 22 - 25, 2018 (M-Th)

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Partial Pressure Analysis with Residual Gas Analyzers

Course Objectives
  • Provide the basic knowledge required to operate residual gas analyzers (RGAs) in vacuum applications ranging from UHV to atmospheric pressures. 
Learn:
  • Basic operation principles of mass spectrometers for residual gas analysis.
  • How to specify the best RGA system configuration for your application.
  • How to configure RGA software and process control I/O to perform gas analysis and track real-time changes in gas composition. 
  • Routine maintenance, tuning and calibration procedures.
  • Quantitative compositional analysis and process control (actionable information) options.
  • Spectral Interpretation: Quickly and effectively interpret typical RGA spectra. Monitor the quality of your vacuum process. Fingerprint your gas chamber. Chamber matching opportunities.
  • How to differentiate between background and process gases 
  • Typical chemical interactions between RGAs and sampled gases.

Instructor: Gerardo Brucker, Chief Scientist and CTO working at the Granville-Phillips Division of MKS Instruments. 
Date:  October 25, 2018 (Th)

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Plasma Etching and RIE: The Fundamentals

Course Objectives:

The Fundamentals

  • Know the basic concepts of plasma etching.
  • Understand the physics of RF glow discharges (both high and low density).
  • Understand the surface science aspects of reactive ion etching (RIE).
  • Learn about plasma-surface chemistry leading to etching.
  • Recognize the factors that influence etching anisotropy.

Instructor: Randy Shul, Technical Staff, Sandia National Laboratories  
Date:  October 22, 2018 (M)

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Plasma Etching and RIE: Fundamentals and Applications

Course Objectives

The Fundamentals:

  • Know the basic concepts of plasma etching.
  • Understand the physics of RF glow discharges (both high and low density).
  • Understand the surface science aspects of reactive ion etching (RIE).
  • Learn about plasma-surface chemistry leading to etching.
  • Recognize the factors that influence etching anisotropy.

Applied Aspects:

  • Know fluorocarbon plasma etching of Si and its compounds.
  • Learn about etching of Al, organics, III-V compounds, etc.
  • Understand selectivity, loading effects, ARDE, uniformity, damage, feature charging, particles, wall reactions, etc.
  • Become familiar with plasma diagnostics. 

Instructor: Randy Shul, Technical Staff, Sandia National Laboratories  
Date:  October 22-23, 2018 (M-T)

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Sputter Deposition

Course Objectives
  • Understand target effects and sputtered atoms
  • Learn about magnetron, diode, triode, and ion beam systems
  • Learn about DC and RF systems for targets and substrates
  • Understand reactive sputtering
  • Understand film properties and learn system parameters 

Instructor: Joe Greene, Professor of Materials Science and Head of Electronics Materials Division, University of Illinois
Date:  October 23, 2018 (T)

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UHV Design and Practices

Course Objectives
  • Understand the pump factors that limit ultimate pressure.
  • Know the degassing methods that minimize the total outgassing rate.
  • Learn how to measure total and partial pressures in UHV.
  • Learn the operating methods necessary to maintain UHV.

Instructor: Michael Bagge-Hansen staff scientist, Lawrence Livermore National Lab, Livermore, California 
Date: October 24, 2018 (W) 

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Vacuum Leak Detection

Course Objectives
  • Learn how to analyze vacuum systems and other closed systems for leaks during operation.
  • Learn to use mass spectrometer leak detectors and residual gas analyzers to locate and measure leaks.
  • Know the most effective ways to connect a mass spectrometer leak detector or residual gas analyzer to a vacuum system.

Instructor: Neil Peacock Consultant, Pine Place Consulting
Date: October 22, 2018 (M) 

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REGISTRATION OPEN




*Courses are subject to cancellation