Technical Program: Divisions & Groups
Advanced Surface Engineering (SE)
The program of the Advanced Surface Engineering Division (SE) focuses on all topics related to engineering the properties and functionalities of surfaces of all kinds. Both fundamental scientific and application-oriented contributions presenting experimental and/or theoretical and computational results are included. The session “Plasma-assisted Surface Modification and Deposition Processes” presents contributions aimed at understanding or further developing techniques and processes to alter the appearance of surfaces or to synthesise thin films and coatings on surfaces of interest. Two invited talks will address reactive high power impact magnetron sputtering and the plasma surface engineering of biomaterials. Topics related to analysis, characterisation and application of such modified surfaces and new and advanced characterisation techniques will be covered by the session “Nanostructured Thin Films and Coatings”. An invited talk will present the optimized synthesis of TiB2 coatings using different deposition techniques. The frequent application of coatings to protect the underlying surface from environmental influences will be addressed by a second invited talk on adaptive ceramic coatings for extreme environments. All invited lectures will review and highlight the state-of-the-art and latest findings in the respective topic. Academic, industry and national laboratory scientists, technicians and especially junior researchers and PhD students from various disciplines and all countries contribute to our diverse and interesting technical program including two oral sessions and one poster session.
Applied Surface Science (AS)
The Applied Surface Science Division (ASSD) provides a forum for research in the preparation, modification, characterization, and utilization of surfaces in practical applications. Areas of interest range from nanoscience, polymers, and semiconductor processing to forensic science and biotechnology. The Division has long been the premier gathering place for the global surface analysis community, with historical concentrations in techniques such as SIMS and XPS/Auger spectroscopies, including presentations representing a mixture of cutting-edge applications and fundamentals supporting the measurement science. We also encourage contributions from nontraditional techniques such as Atom Probe Tomography. The Division is constantly striving to provide a forum for current and mature interests (with sessions such as Quantitative Surface Analysis and Practical Surface Analysis) while identifying key areas for future development. For AVS-64, we are supporting several topics outside of ASSD: Tribology (TR), Spectroscopic Ellipsometry (EL), Scanning Probe Microscopy (SP), Novel Trends in Synchrotron and FEL-Based Analysis (SA), Actinides and Rare Earths (AC), Biointerfaces (BI), Nanoscale Imaging (NS) and Tandem MS (TM). Several special sessions this year are designed to showcase industrial and novel applications of surface analysis.
Biomaterial Interfaces (BI)
The Biomaterials Interfaces Division will be running a series of sessions to provide an interdisciplinary forum for the presentation and discussion of fundamental aspects of bio-interface science and engineering. The need to increase our understanding of the interactions between biomolecules and surfaces, the behavior of complex macromolecular systems and cells at materials interfaces, and interactions between biomolecules, is being driven by the rapid growth in environmental and biomedical research and the role these applications play in the fields of biology, biotechnology, antifouling technology, diagnostics, dentistry and medicine. The BI program brings together recent advances made in materials science and molecular biology with sophisticated surface and interface analysis methods and theoretical and modeling approaches to biological systems. The oral presentation sessions include the following areas of interest: Engineering a paradigm shift in control of microbes and fouling, Bio from 2D to 3D: Challenges in fabrication and characterization, Biomaterials and Nanomaterials Fabrication, Characterization of Biological and Biomaterial Surfaces, Biomolecules and Biophysics at interfaces, and a session in honor of Dave Castner's 65th birthday on multitechnique bio-surface characterization. On Tuesday evening we will feature FLASH Oral Presentations, with an accompanying Networking Session involving associated traditional poster presentations. Prizes will be awarded for the best FLASH/Poster Presentation.
Electronic Materials & Photonics (EM)
The Electronic Materials and Photonics Division (EMPD) encompasses the science and engineering of materials, interfaces, and processing that advance electronic, photonic, or optoelectronic device technologies. AVS 64 will include sessions on emerging topics such as quantum information, valleytronic devices, nanophotonics, and phase change and ultrawide band gap materials, in addition to core topics such as computing beyond Moore's Law, III-V materials and their heterostructures, Heusler compounds, nanostructures, and more. EMPD consistently attracts distinguished invited speakers from around the globe. We will host over 15 invited speakers this year including: Tony Heinz (Stanford University), Teri Odom (Northwestern University), David Awschalom (University of Chicago), Robert Wallace (University of Texas at Dallas), Efrat Lifschitz (Technion), Arka Majumdar (University of Washington), Masataka Higashiwaki (National Institute of Information and Communications Technology), and Paul McIntyre (Stanford University). A new poster competition will be held at AVS 64 with winning presenters receiving a $500 cash prize. As in prior years, postdoc travel awards will be available. The EMPD industrial forum will also return and provide an intimate opportunity for students to meet with company representatives.
Magnetic Interfaces & Nanostructures (MI)
This years’ MIND program will cover a wide area of topics ranging from chiral magnetism over magnetism and spin orbit effects at interfaces to magnetism in organic system. The focus of the program is to cover areas of magnetism that are fascinating from a fundamental point of view but which carry significance for future applications. The program will start on Monday morning with a series of four talks addressing magnetic structures with chiral symmetry. Such structures are induced by interface interactions and the presenters will describe the possibility to create, manipulate and employ features like e.g. skyrmions for future applications. The remainder of the presentations on Monday is dedicated to magnetism and spin orbit effects at interfaces, including novel state of the art experimental methods to characterize magnetic interfaces. Spintronic applications depend on materials, in which the spin degeneracy of electron states is lifted. This situation can, for example, be caused by magnetic exchange or spin-orbit interaction. The latter is observed in Rashba systems and topological insulators. The invited talks of this afternoon session focus on the theoretical description of electronic structure in spintronic materials as well as the peculiar correlation between superconductivity and interface properties in high Tc materials. The contributed talks cover experimental results obtained with a variety of techniques able to resolve the spin character of the electron states: scanning tunneling spectroscopy, angle-resolved photoemission and inverse photoemission as well as momentum. The Tuesday afternoon session is a joint session between Magnetic Interfaces and Nanostructure (MIND) as well as Electronic Materials (EM). The session will consist of invited and contributed talks dedicated to new magnetic materials based on organic compounds and state of the art device concepts for quantum computing and low power electronics. The areas of organic magnetism as well as single spin manipulation are closely related to new concepts for information processing and storage, which is why we believe that this session should be attractive to a diverse audience interested in these fields.
MEMS & NEMS (MN)
The AVS64 MN program opens the symposium with a feature session on the frontiers of large scale integration and nanosensors: from gas sensing to mass spectrometry and from integrated neural probes to cilia inspired smart microfluidics (with dancing cancer cells to boot). **Our Monday afternoon optomechanics session highlights RF acoustic interaction with nano-optomechanics, touches on in situ microring "trimming", and finishes with nano-manufactured metamaterials from plates to conducting inks to nanoimprinted micro caps. **On Tuesday morning, we welcome an industry presentation that brings high power relays to the MEMS regime, watch an electron-phonon waltz in acoustoelectrics, and see a MEMS that just keeps on ringing after turning off power. Surfaces finishes this session with self-assembled synthetic nanostructures and heat-sustained plastrons (underwater surface bubbles). **On Wednesday morning, we delve into 2D NEMS with highlights of ion radiation effects, strain engineered sensors, parametric amplification, and evidence for directional thermal conductivity. Two student award nominees also speak at this session. Our Tuesday night poster session showcases two more student award nominee presentations. **Highlights from our partner sessions include a Tuesday afternoon optomechanics session from NS and a MEMS scale vacuum pump from VT (first thing TuA). **In general, the MN program highlights the latest advances in broad areas of micro/nanoelectromechanical systems (MEMS/NEMS). It covers novel materials, processes, devices, and emerging functions and applications of MEMS/NEMS, within various areas including manufacturing, energy, communication, and healthcare. The ability to manipulate and engineer mechanical structures in emerging low-dimensional materials creates intriguing possibilities of integrating these devices with existing fluidic, electronic and optical on-chip networks. ** MN themes cover multiscale phenomena, emerging materials and technologies, new devices, advanced and additive manufacturing, novel fabrication, characterization, integration, and packaging of MEMS/NEMS. Additional themes continue in optical MEMS/NEMS, micro/nanophotonics, optomechanics, quantum MEMS/NEMS, 2D MEMS/NEMS, resonant systems, CMOS-MEMS, mesoscopic dynamics and dissipation processes, inertial sensors, chemical sensors and lab-on-chip analytical microsystems, harsh-environment transducers, parametric and nonlinear effects, MEMS/NEMS-enabled energy technologies, soft materials, flexible and implantable MEMS/NEMS for biosensing, bio-inspired microsystems, wearables, and wireless healthcare.
Manufacturing Science & Technology (MS)
MSTG sessions present research topics related to the science and technology of manufacturing. This year we focus on challenges in additive manufacturing, advanced characterization and metrology challenges for IC manufacturing, and sustainable manufacturing. Our session on working with government labs and user facilities enables representatives of these labs and user facilities to present the capabilities of their organizations and how the AVS attendees can work with them.
Nanometer-scale Science & Technology (NS)
At the most inclusive level, nanotechnology is anything that involves materials that have structure 100 nm or smaller. Many of the most interesting areas of nanotechnology involve materials or systems whose properties change dramatically as they decrease in size from the bulk, or as surfaces become dominant. Nanoscience and Nanotechnology have become pervasive throughout the scientific community as can be attested by the multiple sessions addressing their different aspects at the AVS Symposium.
At the NSTD sessions, researchers from around the globe will present their work on topics such as nanoscale devices and quantum systems, exploiting nanomaterials for applications in photonics, plasmonics, catalysis, surface chemistry, sensors, biomechanics, imaging, and energy, including nanoscale characterization and spectroscopy. This year the program will highlight the following:
(a) A session focusing on the science and technology of oxides at the nanoscale; (b) Advances in the fabrication and manufacturing at the nanoscale; (c) Recent developments in the characterization of materials at the nanometer scale, and including a joint session on recent advances in scanned probe microscopy; (d) Areas of convergence between nanotechnology and electrical, magnetic, mechanical, and optical devices and phenomena. (e) The program will also include a special session on the applications of nanotechnology in renewable energies.
Plasma Science & Technology (PS)
The 2017 Plasma Science and Technology Division (PSTD) program highlights state-of-the-art advances in plasma research, ranging from fundamental studies of plasma physics and chemistry to applied research in plasma etching, deposition, and nanomaterials enablement. Two parallel sessions each day feature topics of interest to both the atmospheric pressure plasma community and the semiconductor processing community. The week opens with sessions on atmospheric pressure plasma processing, alongside two sessions on medical, biomaterial, and agricultural applications offered by the Plasma for Biomedical Applications Focus Topic. Following we have sessions on FEOL and BEOL plasma etching, plasma deposition, and plasma-enhanced ALD. Of particular note are two complete sessions on the extremely hot topic of Atomic Layer Etching featuring talks from both industry and academia. Additional elements of the program include the always-popular sessions on Plasma Surface Interactions, Plasma Diagnostics, Plasma Sources, and Nanomaterials. The Plasma Modeling session this year offers a special invited presentation: the Plasma Prize Talk given by Professor Satoshi Hamaguchi. Finally, the Plasma Science and Technology Division is honored to be the host of a very Special Session on Tuesday Afternoon on "The Science of Plasmas and Surfaces: Commemorating the Career of Harold Winters" which features tutorials looking backward and opportunities looking forward given by ten of the most notable plasma science and technology researchers of our time.
Surface Science (SS)
The program of the Surface Science Division (SS) provides a forum for cutting-edge and foundational research that involves solid surfaces and interfaces. Phenomena that take place at the gas-solid and liquid-solid interfaces are prominent within the SS Division programs. Technical sessions address atomistic, structural, electronic, and chemical phenomena at surfaces and interfaces, their impact on materials properties, and their implication for technological and environmental processes. Surface chemistry is an important divisional theme, encompassing the kinetics and dynamics of surface processes and chemical events from adsorption and reaction to catalysis. Film and nanostructure growth is another key theme, explored from a fundamental perspective, through the development of new growth and processing methods for materials preparation. Surface chemical modification and photon-driven chemistry at surfaces are important concentrations. Lively sessions are devoted to the surface science of metallic, semiconductor, oxide and organic surfaces that support unique chemical activity and electronic properties. Surface science applications in high-impact areas, including energy science, microelectronics, nanotechnology, and environmental science, are highlighted in the program. This Division's overarching goal is to provide the atomistic insights on solid surfaces and interfaces needed to advance our understanding of materials systems and benefit society.
This year’s Surface Science Division sessions are listed below. Many of the sessions are co-sponsored with other Divisions, Groups, and Focus Topics and should be of broad interest to attendees. In particular several SS sessions complement the Fundamental Discoveries in Heterogeneous Catalysis Focus Topic (HC) sessions beginning on Tuesday afternoon and running throughout the rest of the week. Tuesday’s SS poster session features the finalists for the Morton M. Traum Surface Science Division Student Award.
Thin Films (TF)
The Thin Films Division continues its strong presence at AVS by offering several core oral sessions and one poster session. This year, we are excited about the broad range of outstanding invited speakers that will touch on topics across the breadth of thin film science and technology. There are several sessions dedicated to atomic layer deposition (ALD), encompassing energy conversion and storage, emerging applications, nanostructures, precursors, surface reactions, as well as advances in high throughput and spatial processes. These sessions highlight basic science and the pursuit of applications. Of particular note is the John A. Thorton Memorial Award lecture provided on Tuesday afternoon by Stephen George (Univ. Colorado at Boulder that provides highlights of ALD over the past 25 years.
The Thin Films Division is also excited about the continuation of core sessions on the growth and characterization of thin films and the formation of self-assembled thin films. We offer thin film application inspired sessions on sessions on thin films for synchrotron radiation, magnetics, photovoltaics, and microelectronics. These talks are aligned with AVS vision of exploring the industrial needs of thin films community and are highlighted by an invited talk by Mahendra Pakala (Applied Materials) who will provide a unique industry perspective on thin film processing of emerging resistive memory devices.
Furthermore, we offer students the possibility to give a 2-3 minute talk to introduce their posters at the end of the oral sessions. For the 5th year, we will host a student-only session to highlight the Harper Award candidates in which the student finalists will present their work in an interactive “TED Talk” type of Forum. This is an excellent opportunity for graduate and undergraduate students in the Thin Film area to get together informally for discussions and to provide feedback for the Harper Award presentations of their fellow students.
Vacuum Technology (VT)
The Vacuum Technology Division (VTD) provides a forum for research in achieving, maintaining, measuring, and analyzing vacuum across a wide range of pressures and applications. The 2017 VT oral program topics include: (1) Progress in Vacuum Measurement, especially in the area of optical and MEMS total pressure sensors for calibration standards and industry as well as with partial pressure instruments, (2) Vacuum Pumping,(3) Wall-Vacuum interface, (4) Vacuum transportation and clean systems and (5) Accelerator and Large Vacuum Systems. Additionally, we present a special session in Vacuum History. The VT Poster session Tuesday evening features the VT Student Poster Competition, with a first place award of up to $500, where students of any discipline are invited to share their innovative solutions to vacuum equipment challenges. Student presenter awards will also be given for the best presentations. To be eligible for a student prize, the presenter must be registered as a student and present the work in a VT poster or oral session.