The AVS 26th International Conference on Atomic Layer Deposition (ALD 2026) featuring the 13th International Atomic Layer Etching Workshop (ALE 2026) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching.  Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2026 Workshop (ALE 2026), so that attendees can interact freely. The conference will take place Sunday, June 28 - Wednesday, July 1, 2026, in Tampa, Florida.

As in past conferences, the meeting will be preceded by one day of tutorials and a welcome reception. Sessions will take place (Monday-Wednesday) along with an industry tradeshow. All presentations will be audio-recorded and provided to attendees following the conference (posters will be included as PDFs). Anticipated attendance is 800+.